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Performance and Reliability of Thick Cu Interconnects for RF and Analog/Mixed Signal Technology
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- MRS Online Proceedings Library Archive / Volume 1559 / 2013
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- 29 May 2013, mrss13-1559-aa08-08
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- 2013
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Reliability and validity of a semi-quantitative FFQ for sodium intake in low-income and low-literacy Brazilian hypertensive subjects
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- Public Health Nutrition / Volume 12 / Issue 11 / November 2009
- Published online by Cambridge University Press:
- 28 May 2009, pp. 2168-2173
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Resistivity–temperature behavior of dilute Cu(Ir) and Cu(W) alloy films
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- Journal of Materials Research / Volume 20 / Issue 12 / December 2005
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- 01 December 2005, pp. 3391-3396
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- December 2005
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Crystallinity and Wet Etch Behavior of HfO2 Films Grown by MOCVD
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- MRS Online Proceedings Library Archive / Volume 786 / 2003
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- 01 February 2011, E3.19
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- 2003
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Texture and Resistivity of Cu and Dilute Cu Alloy Films
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- MRS Online Proceedings Library Archive / Volume 721 / 2002
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- 01 February 2011, J3.1
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- 2002
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Influence of Substrate Temperature During Sputter Deposition on the Subsequent Formation of Titanium Disilicide
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- MRS Online Proceedings Library Archive / Volume 745 / 2002
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- 11 February 2011, N6.4
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- 2002
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In-Situ Studies of Silicide Formation in Ti-Ta Bilayer Thin Films on Poly-Si
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- MRS Online Proceedings Library Archive / Volume 721 / 2002
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- 01 February 2011, J2.4
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- 2002
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The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
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- MRS Online Proceedings Library Archive / Volume 716 / 2002
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- 01 February 2011, B8.5
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- 2002
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A Self-Aligned Silicide Process Utilizing Ion Implants for Reduced Silicon Consumption and Control of the Silicide Formation Temperature
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- MRS Online Proceedings Library Archive / Volume 716 / 2002
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- 01 February 2011, B1.7
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- 2002
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Cu and Dilute Binary Cu(Ti), Cu(Sn) and Cu(Al) Thin Films: Texture, Grain Growth and Resistivity
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- MRS Online Proceedings Library Archive / Volume 721 / 2002
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- 01 February 2011, J3.2
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- 2002
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A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs with Shallow Junctions
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- MRS Online Proceedings Library Archive / Volume 686 / 2001
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- 15 March 2011, A3.3
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- 2001
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Oxygen Stoichiometry in PdOxand PdOx/Pt Electrode Layers During Processing of Ferroelectric and High-epsilon Perovskites
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- Journal of Materials Research / Volume 15 / Issue 4 / April 2000
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- 31 January 2011, pp. 961-966
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- April 2000
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Optimization of Ta–Si–N thin films for use as oxidation-resistant diffusion barriers
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- Journal of Materials Research / Volume 15 / Issue 1 / January 2000
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- 31 January 2011, pp. 194-198
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- January 2000
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In situ and Ex situ Measurements of Stress Evolution in the Cobalt-Silicon System
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- MRS Online Proceedings Library Archive / Volume 611 / 2000
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- 14 March 2011, C6.3.1
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- 2000
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Electrodes and Barriers for Dram and Feram: Processing, Integration, and Fundamentals
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- MRS Online Proceedings Library Archive / Volume 655 / 2000
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- 21 March 2011, CC2.1.1
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- 2000
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Mechanisms for enhanced C54–TiSi2 formation in Ti–Ta alloy films on single-crystal Si
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- Journal of Materials Research / Volume 14 / Issue 12 / December 1999
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- 31 January 2011, pp. 4690-4700
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- December 1999
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Al–Ta Bilayer as an Oxidation Resistant Barrier for Electrode Structures in High Dielectric Constant Capacitors
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- Journal of Materials Research / Volume 14 / Issue 4 / April 1999
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- 31 January 2011, pp. 1581-1588
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- April 1999
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Layered TaSiN as an Oxidation Resistant Electrically Conductive Barrier
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- Journal of Materials Research / Volume 14 / Issue 4 / April 1999
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- 31 January 2011, pp. 1604-1609
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- April 1999
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Mechanisms for Microstructure Evolution in Electroplated Copper Thin Films
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- MRS Online Proceedings Library Archive / Volume 562 / 1999
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- 10 February 2011, 223
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- 1999
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Characterization of Plated Cu Thin Film Microstructures
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- MRS Online Proceedings Library Archive / Volume 562 / 1999
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- 10 February 2011, 209
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- 1999
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